Authors: Kenneth C. Johnson
A spot-scanning, maskless EUV lithography system using singlet zone-plate lenses for spot generation exhibits significant chromatic dispersion, but the dispersion can be neutralized by means of a diffractive, phase-Fresnel mirror in the projection optics. The same dispersion compensation method can be used in the context of EUV mask-projection lithography using a diffractive photomask, which can focus illumination onto sparse image patterns for high-dose, aberration-free printing.
Comments: 34 Pages.
[v1] 2019-11-21 13:59:46
Unique-IP document downloads: 11 times
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