Classical Physics


Extreme-Ultraviolet Plasma Radiation Source with Wide-Angle Plasma Irradiation and Collection

Authors: Kenneth C. Johnson

A variety of source collection mirror designs can provide an output beam with a wide collection angle and good uniformity, for an EUV lithography system using a laser-produced plasma source. The collection mirror can also perform the dual-use function of focusing wide-angle laser radiation onto the plasma as well as collecting EUV emission from the plasma.

Comments: 35 Pages.

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Submission history

[v1] 2019-06-01 17:17:34

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