Authors: Kenneth C. Johnson
A variety of source collection mirror designs can provide an output beam with a wide collection angle and good uniformity, for an EUV lithography system using a laser-produced plasma source. The collection mirror can also perform the dual-use function of focusing wide-angle laser radiation onto the plasma as well as collecting EUV emission from the plasma.
Comments: 35 Pages.
[v1] 2019-06-01 17:17:34
Unique-IP document downloads: 12 times
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