Authors: Kenneth C. Johnson
A variety of source collection mirror designs can provide an output beam with a wide collection angle and good uniformity, for an EUV lithography system using a laser-produced plasma source. The collection mirror can also perform the dual-use function of focusing wide-angle laser radiation onto the plasma as well as collecting EUV emission from the plasma.
Comments: 35 Pages.
[v1] 2019-06-01 17:17:34
Unique-IP document downloads: 5 times
Vixra.org is a pre-print repository rather than a journal. Articles hosted may not yet have been verified by peer-review and should be treated as preliminary. In particular, anything that appears to include financial or legal advice or proposed medical treatments should be treated with due caution. Vixra.org will not be responsible for any consequences of actions that result from any form of use of any documents on this website.
Add your own feedback and questions here:
You are equally welcome to be positive or negative about any paper but please be polite. If you are being critical you must mention at least one specific error, otherwise your comment will be deleted as unhelpful.