Authors: Kenneth C. Johnson
A plasma light source for EUV lithography can be spectrally filtered by a phase-Fresnel collector mirror to reject all out-of-band (OoB) radiation in the IR-to-VUV spectral range, leaving only pure EUV in the filtered output. EUV collection efficiency is not significantly compromised, and EUV conversion efficiency can be enhanced by recycling rejected or uncollected OoB radiation back to the plasma via retroreflection. [U.S. Patent 9,612,370.]
Comments: 27 Pages. Revised title and abstract; other minor edits.
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