Authors: Kenneth C. Johnson
A plasma light source for EUV lithography can be spectrally filtered by a phase-Fresnel collector mirror to reject all out-of-band radiation in the IR-to-VUV spectral range, leaving only pure EUV in the filtered output. EUV collection efficiency is not significantly compromised, and EUV conversion efficiency can be enhanced by recycling rejected or uncollected IR back to the plasma via retroreflection. [U.S. Patent 9,612,370.]
Comments: 24 Pages. v6 changes: Added Figure 20 and associated discussion.
Unique-IP document downloads: 149 times
Vixra.org is a pre-print repository rather than a journal. Articles hosted may not yet have been verified by peer-review and should be treated as preliminary. In particular, anything that appears to include financial or legal advice or proposed medical treatments should be treated with due caution. Vixra.org will not be responsible for any consequences of actions that result from any form of use of any documents on this website.
Add your own feedback and questions here:
You are equally welcome to be positive or negative about any paper but please be polite. If you are being critical you must mention at least one specific error, otherwise your comment will be deleted as unhelpful.