Authors: Kenneth C. Johnson
A plasma light source for EUV lithography can be spectrally filtered by a phase-Fresnel collector mirror to reject all out-of-band radiation in the IR-to-VUV spectral range, leaving only pure EUV in the filtered output. EUV collection efficiency is not significantly compromised, and EUV conversion efficiency can be enhanced by recycling rejected or uncollected IR back to the plasma via retroreflection. [Patent Pending PCT/US16/34172.]
Comments: 23 Pages. v5 changes: Revised Fig. 6 and discussion; patent pending notice.
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