Authors: Kenneth C. Johnson
This paper describes an EUV spot-scanning microscope, which performs actinic, through-pellicle photomask inspection for EUV lithography. A primary benefit of spot-scanning microscopy is that it provides access to each illuminated spot’s angular reflectance spectrum, which is sensitive to pure-phase mask defects. Additionally, the spot generation and detection optics can entirely nullify geometric aberrations in the imaging system, potentially resulting in simplified, lower-cost and higher-performing imaging optics.
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