Authors: Kenneth C. Johnson
This paper outlines a design concept for an EUV microscope, which is applicable to actinic photomask inspection in semiconductor manufacture with EUV lithography. The microscope employs a raster-scanned, focused-spot array, using a commercial EUV plasma source and achromatic EUV-transmission microlenses for spot generation.
Comments: 6 Pages.
[v1] 2015-09-30 00:23:47
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