Classical Physics

   

Actinic, Spot-Scanning EUV Mask Inspection System

Authors: Kenneth C. Johnson

This paper outlines a design concept for an EUV microscope, which is applicable to actinic photomask inspection in semiconductor manufacture with EUV lithography. The microscope employs a raster-scanned, focused-spot array, using a commercial EUV plasma source and achromatic EUV-transmission microlenses for spot generation.

Comments: 6 Pages.

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Submission history

[v1] 2015-09-30 00:23:47

Unique-IP document downloads: 35 times

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