DC magnetron sputtering is a well-developed deposition technique for coatings and thin films used in industrial applications. The experiments were performed with unbalanced circular magnetron sputtering targets of aluminium (99.999%) and titanium (99.99%). Sputtering of aluminium (Al) and titanium (Ti) was carried out in pure argon (99.999%) atmosphere at base pressure of 4 × 10−6 torr and constant sputtering pressure of 5 × 10−3 torr. Substrate materials were mainly stainless steel (304) and aluminum plates. Characterization of TiAl films deposited onto different substrates was evaluated using XRD, SEM and EDS analysis techniques. The film surface and cross-section was examined using a scanning electron microscope (SEM). The TiAl phase was confirmed using XRD analysis. The composition of the TiAl film was determined using EDS technique. These characterizations revealed the growth of TiAl intermetallic thinfilm with a characteristic crystallite size of 123.9 Å and a lattice strain of 0.1352%. Also a columnar growth perpendicular to the substrate surface was observed repeatedly in our experiment. The microhardness of the TiAl film had an average value of 1873 HV.
Comments: 6 Pages.
[v1] 2012-08-19 10:49:22
Unique-IP document downloads: 1132 times
Add your own feedback and questions here:
You are equally welcome to be positive or negative about any paper but please be polite. If you are being critical you must mention at least one specific error, otherwise your comment will be deleted as unhelpful.